Changing surface chemistry with plasma technology and its processing methods are used in many industrial and research applications. Surface treatment of a material with a dry method of cleaning, activation, etching and deposition are powerful, cost effective process options. The ability to perform process options with control, repeatability and scalable equipment make plasma treatment a desirable core competency for any manufacturing company or research team.
With plasma activation, non-reactive or non-wettable surfaces can be modified to obtain higher surface energy, better wetting ,and better adhesion properties. This increase in adhesion leads to an improvement in product performance and reliability. Manufacturing processes are easy to set up, optimize and control. Reasonable and even very short process takt times can be achieved in most materials of choice used in industry today.
等离子体清洗时大范围的地址turing operations to include; plasma cleaning (to remove organic materials), plasma cleaning (to remove inorganic materials), antiseptic plasma cleaning (to remove biological elements), ultra-fine plasma cleaning (to improve aerospace and micromechanical devices), and degreasing.
Plasma coating is an application that uses an additive process that modifies the properties of a material surface. With the help of this treatment method, surfaces can be made hydrophobic, hydrophilic, scratch or corrosion resistant, metallized or many other chemical or molecular surface terminations.
Though the terms “RIE” (reactive ion etching) and “plasma etching” are often used synonymously, they are in fact not the same. Plasma etching is an umbrella term for all etching procedures that can be performed with plasma while RIE is a subtype which employs the acceleration of the charged ions toward the surface of the part. This acceleration increases the etch rate of atoms directionally. Meaning the etch rate of the material perpendicular to the surface is faster that the etch rate of the material parallel to the surface.